Dublin Core The Dublin Core metadata element set is common to all Omeka records, including items, files, and collections. For more information see, http://dublincore.org/documents/dces/. Title A name given to the resource Articles Article Faculty Publications -Articles Dublin Core The Dublin Core metadata element set is common to all Omeka records, including items, files, and collections. For more information see, http://dublincore.org/documents/dces/. Title A name given to the resource Tuning variegated characteristics of NiO thin films via 50keV nitrogen ion beam irradiation Description An account of the resource In this study, a systematic analysis of the changes brought about by low-energy ion beam irradiation in NiO thin films has been carried out. NiO thin films, deposited on glass substrates by RF magnetron sputtering method have been irradiated with 50keV Nitrogen ions (N+) at varied ion fluence values. With N+ irradiation, the intensity of diffraction peak corresponding to (440) decreases up to ion fluence of 1 1016 ion/cm2 due to the irradiation-induced lattice damage. Furthermore, at the highest fluence (5 1016 ions/cm2), the dominancy of (400) is lost and the crystal structure is reoriented to (440) alignment. The low energy ion irradiation has caused a mitigation in thin film transmittance by 25% compared to unirradiated sample. A decrease in the 1LO mode observed from Raman spectroscopy accounts for the formation of Ni vacancy defects at the highest fluence. Ion beam irradiation is seen to tune the material bandgap. The observed reduction in bandgap with an increase in ion fluence can be correlated to the formation of shallow levels near the conduction band of the host material with ion fluence. Bigger grains of pristine NiO thin film are broken into smaller fragments at fluences 5 1015 and 1 1016 ions/cm2. AFM analysis revealed the smoothening of thin film surfaces due to the atomic diffusion arising from ion beam irradiation. The correlated results from structural and morphological analysis support the deposition of subsequent amounts of energy to the lattice and the consequent modifications in the thin film properties. NiO films can thus be tailored with different ion fluences, making them suitable for optical as well as energy storage applications. The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2024. Creator An entity primarily responsible for making the resource Jose L.M.; Siva Kumar V.V.; Vayalil S.K.; Sulania I.; Subramaniam R.T.; Anila E.I.; Aravind A. Source A related resource from which the described resource is derived Journal of Materials Science: Materials in Electronics, Vol-35, No. 34 Publisher An entity responsible for making the resource available Springer Date A point or period of time associated with an event in the lifecycle of the resource 2024-01-01 Identifier An unambiguous reference to the resource within a given context <a href="https://doi.org/10.1007/s10854-024-13879-5" target="_blank" rel="noreferrer noopener">https://doi.org/10.1007/s10854-024-13879-5</a> <br /><br /><a href="https://www.scopus.com/inward/record.uri?eid=2-s2.0-85211150217&amp;doi=10.1007%2Fs10854-024-13879-5&amp;partnerID=40&amp;md5=82194ec3dd41e6807d316f689dd88ce8" target="_blank" rel="noreferrer noopener">https://www.scopus.com/inward/record.uri?eid=2-s2.0-85211150217&amp;doi=10.1007%2fs10854-024-13879-5&amp;partnerID=40&amp;md5=82194ec3dd41e6807d316f689dd88ce8</a> Rights Information about rights held in and over the resource Restricted Access Relation A related resource ISSN: 9574522 Format The file format, physical medium, or dimensions of the resource Online Language A language of the resource English Type The nature or genre of the resource Article Coverage The spatial or temporal topic of the resource, the spatial applicability of the resource, or the jurisdiction under which the resource is relevant Jose L.M., Department of Physics, Centre for Advanced Functional Materials, Bishop Moore College (Affiliated to University of Kerala), Kerala, Mavelikara, 690110, India; Siva Kumar V.V., Material Science Division, Inter-University Accelerator Centre, New Delhi, India; Vayalil S.K., Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, Hamburg, 22607, Germany, Applied Science Cluster, UPES, Energy Acres, Bidholi Campus, Dehradun, 248007, India; Sulania I., Material Science Division, Inter-University Accelerator Centre, New Delhi, India; Subramaniam R.T., Department of Physics, Faculty of Science, Universiti Malaya, Kuala Lumpur, 50603, Malaysia; Anila E.I., Department of Physics and Electronics, Christ (Deemed to Be University), Bangalore, 560029, India; Aravind A., Department of Physics, Centre for Advanced Functional Materials, Bishop Moore College (Affiliated to University of Kerala), Kerala, Mavelikara, 690110, India