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          <name>Title</name>
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              <text>Synthesis and Characterization of WO3 Nanostructures by the Solvothermal Method for Electrochromic Applications</text>
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              <text>annealing; electrochromism; FTO substrates; solvothermal process; WO&lt;sub&gt;3&lt;/sub&gt;</text>
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              <text>In this study, a tungsten trioxide (WO3) thin film was deposited by direct current (DC) sputtering onto a fluorine-doped tin oxide (FTO) substrate as the seed layer at an oxygen partial pressure of 8 10?4mbar. A simple solvothermal method involving tungsten hexacarbonyl (W(CO)6), ethanol (C2H5OH), and hydrochloric acid (HCl) was used to synthesize vertically stacked nanoscale WO3 hierarchical structures on WO3 seed-layered FTO. After the deposition process, the FTO samples with nanostructures were subjected to annealing in air at 400C for 4 h. After annealing, the surface morphology, structural characteristics, and optical and electrochromic properties of the grown nanostructures were investigated using scanning electron microscopy (SEM), x-ray diffraction (XRD), Raman spectroscopy, UVvisible spectroscopy, and electrochemical analysis. From the XRD analysis, all the diffraction patterns were ascribed to a monoclinic phase. The SEM analysis showed that films grown with 5?L HCl had a nanoflower structure compared to the films grown with 0?L HCl and 20?L HCl. The nanoflower-structured films showed a higher cathodic peak current (?2.22mA), diffusion coefficient (5.43 10?9 cm2/s), and coloration efficiency (23.6 cm2/C). The increased electrochromic characteristics were attributed to the nanostructured films, which enhanced the diffusion of H+ ions by providing a large surface area during the charge transfer process.  The Minerals, Metals &amp;amp; Materials Society 2024.</text>
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              <text>Kamath K.; Kumar K.N.; Reddy G.V.A.; Shaik H.; Prabhu S.G.; Jafri R.I.; Shetty H.D.; Manjunatha K.B.</text>
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              <text>Journal of Electronic Materials, Vol-53, No. 8, pp. 4564-4574.</text>
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              <text>Springer</text>
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              <text>2024-01-01</text>
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              <text>&lt;a href="https://doi.org/10.1007/s11664-024-11037-5" target="_blank" rel="noreferrer noopener"&gt;https://doi.org/10.1007/s11664-024-11037-5&lt;/a&gt;
&lt;br /&gt;&lt;br /&gt;&lt;a href="https://www.scopus.com/inward/record.uri?eid=2-s2.0-85190127770&amp;amp;doi=10.1007%2Fs11664-024-11037-5&amp;amp;partnerID=40&amp;amp;md5=a0928f00cf44c773a556b67003b72229" target="_blank" rel="noreferrer noopener"&gt;https://www.scopus.com/inward/record.uri?eid=2-s2.0-85190127770&amp;amp;doi=10.1007%2fs11664-024-11037-5&amp;amp;partnerID=40&amp;amp;md5=a0928f00cf44c773a556b67003b72229&lt;/a&gt;</text>
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              <text>ISSN: 3615235; CODEN: JECMA</text>
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              <text>Online</text>
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              <text>English</text>
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              <text>Kamath K., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Department of Physics, Nitte Mahalinga Adyanthaya Memorial Institute of Technology, Nitte (Deemed to be University), Karkala, 574110, India; Kumar K.N., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Reddy G.V.A., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Shaik H., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Prabhu S.G., Department of Electronics and Communication Engineering, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Jafri R.I., Department of Physics and Electronics, Christ University, Hosur Road, Bengaluru, 560029, India; Shetty H.D., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Manjunatha K.B., Department of Physics, Nitte Mahalinga Adyanthaya Memorial Institute of Technology, Nitte (Deemed to be University), Karkala, 574110, India</text>
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