Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications
- Title
- Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications
- Creator
- Kumar K.N.; Reddy G.V.A.; Sattar S.A.; Jafri R.I.; Premkumar R.; Muthukrishnan M.; Ahamed A.A.; Meera M.R.; Prakash N.G.; Tighezza A.M.; Ko T.J.
- Description
- In this work, tungsten oxide (WO3) films were deposited at room temperature and annealed for 2h at 400C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeters per minute (SCCM). X-ray diffraction analysis revealed structural characterization of amorphous and crystalline phases. UV-visible spectroscopy optical transmittance revealed 91% transmittance, and energy-dispersive x-ray spectroscopy (EDS) analysis revealed the absence of impurities and the presence of W and O. An electrochemical analyzer was used to characterize the deposited and annealed WO3 films immersed in the two different electrolyte solutions (H2SO4 and LiClO4 with oxygen flow rates ranging from 2 SCCM to 6 SCCM). It was found that the H2SO4 electrolyte of an annealed WO3 thin film at 2 SCCM demonstrated high coloring efficiency of 50.18cm2/C, and the LiClO4 electrolyte of an annealed WO3 thin film at 4 SCCM demonstrated high coloring efficiency of 20.06cm2/C. The Minerals, Metals & Materials Society 2024.
- Source
- Journal of Electronic Materials, Vol-53, No. 5, pp. 2351-2366.
- Date
- 2024-01-01
- Publisher
- Springer
- Subject
- electrochromic properties; H2SO4; LiClO4 electrolytes; Oxygen flow rates; sputtering
- Coverage
- Kumar K.N., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Centre for Nano-materials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Reddy G.V.A., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Sattar S.A., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Jafri R.I., Department of Physics and Electronics, Christ University, Hosur Road, Bengaluru, 560029, India; Premkumar R., Department of Physics, N.M.S.S.V.N. College, Tamil Nadu, Nagamalai, Madurai, 625019, India; Muthukrishnan M., Department of Physics, Sona College of Technology, Tamil Nadu, Salem, 636005, India; Ahamed A.A., Department of Chemistry, Jamal Mohamed College (Autonomous), Affiliated to Bharathidasan University, Tamil Nadu, Trichy, 620020, India; Meera M.R., Department of Physics, Sree Ayyappa College for Women, Tamil Nadu, Chunkankadai, Nagercoil, 629 003, India; Prakash N.G., School of Mechanical Engineering, Yeungnam University, 280 Daehak-ro, Gyeongsangbuk-do, Gyoungsan-si, 38541, South Korea; Tighezza A.M., Department of Chemistry, College of Science, King Saud University, Riyadh, 11451, Saudi Arabia; Ko T.J., School of Mechanical Engineering, Yeungnam University, 280 Daehak-ro, Gyeongsangbuk-do, Gyoungsan-si, 38541, South Korea
- Rights
- All Open Access; Hybrid Gold Open Access
- Relation
- ISSN: 3615235; CODEN: JECMA
- Format
- Online
- Language
- English
- Type
- Article
Collection
Citation
Kumar K.N.; Reddy G.V.A.; Sattar S.A.; Jafri R.I.; Premkumar R.; Muthukrishnan M.; Ahamed A.A.; Meera M.R.; Prakash N.G.; Tighezza A.M.; Ko T.J., “Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications,” CHRIST (Deemed To Be University) Institutional Repository, accessed February 24, 2025, https://archives.christuniversity.in/items/show/13152.