Dublin Core The Dublin Core metadata element set is common to all Omeka records, including items, files, and collections. For more information see, http://dublincore.org/documents/dces/. Title A name given to the resource Articles Article Faculty Publications -Articles Dublin Core The Dublin Core metadata element set is common to all Omeka records, including items, files, and collections. For more information see, http://dublincore.org/documents/dces/. Title A name given to the resource Formulation of Nickel OxideGraphene Composite Ink and the Fabrication of Thin-Film Electrodes Using Direct Ink Writing Subject The topic of the resource composite ink; direct ink writing; nanoparticle synthesis; Nickel oxide ink; nickel oxidegraphene ink Description An account of the resource Nickel oxide (NiO) is a p-type material with a wide bandgap of 3.6 to 4eV, and graphene is a zero-bandgap material. When the two materials are combined to form a composite, their structural, optical, and electrical properties are enhanced. This work presents the formulation of nickel oxide (NiO)graphene composite ink (with ethylene glycol as a solvent) for the fabrication of thin-film electrodes using a direct ink writing technique. NiO is used in nanopowder form, which is prepared via a wet-chemical approach. NiO ink is prepared in three different concentrations of 40mg/ml (N1), 60mg/ml (N2), and 70mg/ml (N3). Graphene ink (G) is also prepared in concentrations of 0.5mg/ml (G1), 1mg/ml (G2), and 2mg/ml (G3). Among the pure NiO inks, it was observed that low resistance and uniform printing were obtained for N2. Therefore, N2 is mixed with different concentrations of graphene to form the composite ink, which is further printed on the substrates. The rheological properties of all the formulated inks are measured. An extrusion-based direct-write system is employed for printing the inks on a glass substrate. The printed samples are characterized before and after annealing at 250C for 2h. The resistance of the composite ink (N2G1) is decreased by 53% in comparison with the pure NiO ink (N2). As the conductivity of the composite ink thin film is in the range of M?, they could find application in the field of gas sensing and thermistors. The Minerals, Metals &amp; Materials Society 2024. Creator An entity primarily responsible for making the resource Thakur N.; Thomas N.; Koshy A.M.; Swaminathan P.; Murthy H. Source A related resource from which the described resource is derived Journal of Electronic Materials, Vol-53, No. 5, pp. 2573-2582. Publisher An entity responsible for making the resource available Springer Date A point or period of time associated with an event in the lifecycle of the resource 2024-01-01 Identifier An unambiguous reference to the resource within a given context <a href="https://doi.org/10.1007/s11664-024-10984-3" target="_blank" rel="noreferrer noopener">https://doi.org/10.1007/s11664-024-10984-3</a> <br /><br /><a href="https://www.scopus.com/inward/record.uri?eid=2-s2.0-85187653988&amp;doi=10.1007%2Fs11664-024-10984-3&amp;partnerID=40&amp;md5=1998b426578b42d32c21ef101d964bbc" target="_blank" rel="noreferrer noopener">https://www.scopus.com/inward/record.uri?eid=2-s2.0-85187653988&amp;doi=10.1007%2fs11664-024-10984-3&amp;partnerID=40&amp;md5=1998b426578b42d32c21ef101d964bbc</a> Rights Information about rights held in and over the resource All Open Access; Hybrid Gold Open Access Relation A related resource ISSN: 3615235; CODEN: JECMA Format The file format, physical medium, or dimensions of the resource Online Language A language of the resource English Type The nature or genre of the resource Article Coverage The spatial or temporal topic of the resource, the spatial applicability of the resource, or the jurisdiction under which the resource is relevant Thakur N., Department of Electronics and Communication, CHRIST (Deemed to be University), Karnataka, Bengaluru, 560074, India; Thomas N., Electronic Materials and Thin Films Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Madras, Chennai, 600036, India; Koshy A.M., Electronic Materials and Thin Films Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Madras, Chennai, 600036, India; Swaminathan P., Electronic Materials and Thin Films Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Madras, Chennai, 600036, India; Murthy H., Department of Electronics and Communication, CHRIST (Deemed to be University), Karnataka, Bengaluru, 560074, India