ItemArticle

Sputter deposited tungsten oxide thin films and nanopillars: Electrochromic perspective

Title
Sputter deposited tungsten oxide thin films and nanopillars: Electrochromic perspective
Creator
Naveen Kumar K.; Shaik H.; Gupta J.; Sattar S.A.; Jafri R.I.; Pawar A.; Madhavi V.; G V A.R.; G N.
Description
Tungsten oxide (WO3) thin films and nano pillars were grown on FTO and corning substrates by using DC magnetron sputtering. Structural properties, surface morphology, optical properties, and electrochromic properties were systematically characterized by using SEM, XRD, UVVis Spectrometer, and Electrochemical Analyser respectively. Increased oxygen partial pressure resulted a rise in the optical transmittance from 72% to 89% at a wavelength of 600 nm. Moreover, coloration efficiency was also found to vary with partial pressures for both planar and glad from 30.48 cm2C-1 to 78.36 cm2C-1. We observe that glad deposited nano pillars showing higher coloration efficiency as compared to the planar thin film. The coloration efficiency found for the planar thin film and nano pillars at optimized partial pressure are 37.04 cm2C-1 and 78.36 cm2C-1 respectively. A strong influence of oxygen partial pressure and surface to volume ratio has been observed on the coloration efficiency, which can play a major role in the electrochromic application. 2022 Elsevier B.V.
Source
Materials Chemistry and Physics, Vol-278
Date
2022-01-01
Publisher
Elsevier Ltd
Subject
Coloration efficiency; Glad; Partial pressures; Planar; Sputtering; Tungsten oxide (WO3)
Coverage
Naveen Kumar K., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Shaik H., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Gupta J., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Sattar S.A., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Jafri R.I., Department of Physics and Electronics, Christ University, Hosur Road, Bengaluru, 560029, India; Pawar A., Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Department of Electronics and Communications Engineering, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India; Madhavi V., Interdisciplinary Centre for Energy Research, Indian Institute of Science, Bengaluru, 560012, India; G V A.R., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Department of Physics, SJB Institute of Technology, Kengeri, Bengaluru, 560060, Karnataka, India; G N., Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India, Department of Electronics and Communications Engineering, Nitte Meenakshi Institute of Technology, Yelahanka, Bengaluru, 560064, India
Rights
Restricted Access
Relation
ISSN: 2540584; CODEN: MCHPD
Format
Online
Language
English
Type
Article

Collection

Articles

Citation

Naveen Kumar K.; Shaik H.; Gupta J.; Sattar S.A.; Jafri R.I.; Pawar A.; Madhavi V.; G V A.R.; G N., “Sputter deposited tungsten oxide thin films and nanopillars: Electrochromic perspective,” CHRIST (Deemed To Be University) Institutional Repository, accessed February 25, 2025, https://archives.christuniversity.in/items/show/15165.

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