ItemArticle

Exploring the Influence of Etching media on the Electrochemical Behavior of Cr2CTx MXene

Title
Exploring the Influence of Etching media on the Electrochemical Behavior of Cr2CTx MXene
Creator
Ramachandra, Madhushree; Sunajadevi, Kalathiparambil Rajendra Pai; Pinheiro, Dephan
Description
MXenes, a class of 2D materials, have garnered significant attention for energy applications due to their unique properties.This study investigates the influence of different etching media on the synthesis of 2D Cr2CTx MXenederived from cost-effective Cr2AlC MAX phase. Three etching solutions- hydrofluoric acid(HF), HF-forming (lithium fluoride + Hydrochloric acid, LiF+HCl), and non-fluoride (sodium hydroxide, NaOH) have been used to treat ternary carbide Cr2AlC MAX phase under varied reaction conditions. The MXenes, Cr2CTx-HF, Cr2CTx-LiF/HCl, and Cr2CTx-NaOH are structurally, and morphologically characterized using XRD, Raman spectroscopy, TGA, XPS, SEM-EDX, and BET-BJH analysis. Theelectrochemical performance of Cr2CTx MXene is assessed, focusing on its performance in water splitting and supercapacitive applications. The materials exhibitlower overpotential values for hydrogen evolution reaction (HER), oxygen evolution reaction (OER), and demonstrate improved pseudocapacitive behavior, with enhanced energy and power densities. The introduction of surface termination groups in Cr2CTx MXene (Tx = ?F, ?OH, ?O) resulted in a more open and accessible layered structure with an appreciable surface area, without any modifications. This enhancedelectrochemical kinetics, improved ion transport, diffusion, and storage capacity, which are beneficial for electrochemical energy storage and production. 2025 Wiley-VCH GmbH.
Source
Advanced Sustainable Systems;Volume;9;Issue;4;Article No.;2400865;
Date
01-01-2025
Publisher
John Wiley and Sons Inc
Subject
Cr2AlC MAX phase; Cr2CTx MXene; electrocatalysis; etching media; supercapacitor; water splitting
Coverage
Ramachandra M., Department of Chemistry, Christ University, Bengaluru, 560029, India; Sunajadevi K.R.P., Department of Chemistry, Christ University, Bengaluru, 560029, India; Pinheiro D., Department of Chemistry, Christ University, Bengaluru, 560029, India
Rights
Restricted Access; Hardcopy may be available in the library
Relation
ISSN: 23667486;
Format
online
Language
English
Type
Article

Citation

Ramachandra, Madhushree; Sunajadevi, Kalathiparambil Rajendra Pai; Pinheiro, Dephan, “Exploring the Influence of Etching media on the Electrochemical Behavior of Cr2CTx MXene,” CHRIST (Deemed To Be University) Institutional Repository, accessed June 21, 2026, https://archives.christuniversity.in/items/show/21735.

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