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            <description>A name given to the resource</description>
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                <text>Faculty Publications</text>
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              <text>Abraham, Daniel Arulraj; Li, Ai-Dong; KP, Abhilash; T, Kavinkumar</text>
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          <name>Title</name>
          <description>A name given to the resource</description>
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              <text>A Flexible HfO2 Nanofilm deposition on activated carbon fiber using atomic layer deposition method for Uric acid Detection</text>
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              <text>01-01-2026</text>
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              <text>Surfaces and Interfaces;Volume;86;Issue;;Article No.;108704;</text>
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              <text>&lt;a href="https://doi.org/10.1016/j.surfin.2026.108704" target="_blank" rel="noreferrer noopener"&gt;https://doi.org/10.1016/j.surfin.2026.108704&lt;/a&gt; &lt;br /&gt;&lt;br /&gt;&lt;a href="https://www.scopus.com/pages/publications/105029927621?origin=resultslist" target="_blank" rel="noreferrer noopener"&gt;https://www.scopus.com/pages/publications/105029927621?origin=resultslist&lt;/a&gt;</text>
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              <text>Abraham D.A., Department of Chemistry, Green Technology, SINAPS, Saveetha Institute of Medical and Technical Sciences, Saveetha University, Tamil Nadu, 602105, India; Li A.-D., National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, Nanjing University, Nanjing, 210093, China; KP A., Department of Physics and Electronics, Christ University, Bangalore, 560029, India; T K., Centre for Energy and Environment, Department of Physics, Karpagam Academy of Higher Education, Coimbatore, 641021, India</text>
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              <text>Flexible devices are in demand for the future development of electronic products. This study introduces a method where a uniform HfO2 thin nanofilm (10 nm) is deposited on flexible carbon cloth (CC) using atomic layer deposition (ALD). This electrode replaces traditional glassy carbon electrodes and other metal electrodes used in sensor fabrication. The ALD technique is employed for the first time in the fabrication of nanomaterials for non-enzymatic uric acid detection, offering advantages such as a solvent-free, binder-free, and low-chemical synthesis process. Synergistic effect of CC and HfO2 active sites contributes to its benchmark performance as a uric-acid sensors. HfO2 structure can supply more reaction sites and ion diffusion pathways. ALD-derived HfO2 exhibit a significant number of oxygen vacancies due to the suboxide formation. These oxygen vacancies or defects act as charge-trapping sites, and when biomolecules are introduced, the film electrical conductivity is altered. The presence of a uniformly distributed, grainy porous structure explains the successful immobilization of uric acid on HfO?. The highly rough surface and large surface area of 200-HfO?/CC boost uric acid sensitivity by more than five times compared with cleaned CC. This research work confirmed that the sensor possesses high selectivity and good reproducibility, suggesting its ability for practical application. HfO2 with a nanofilm structure was chosen for the selective detection of uric acid for the first time, with higher stability and lower detection level (10 nM) (less than reported literature). Herein, this study presents a promising electrocatalyst for nonenzymatic uric acid detection and real-time monitoring of uric acid in human serum and urine for disease prevention.  2026 Elsevier B.V.</text>
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              <text>Atomic layer dosition; Biomolule detection; Flexible electrode; Nanofilm; Uric acid</text>
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              <text>Elsevier B.V.</text>
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              <text>ISSN: 24680230;</text>
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              <text>Restricted Access; Hardcopy may be available in the library</text>
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              <text>online</text>
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