ItemArticle

Hydrous nickel oxyhydroxide thin films on copper foil as robust electrocatalysts for alkaline oxygen evolution

Title
Hydrous nickel oxyhydroxide thin films on copper foil as robust electrocatalysts for alkaline oxygen evolution
Creator
Shetty, Ankith; Mukherjee, Poulami; Higashimine, Koichi; Taniike, Toshiaki; R. S., Vishwanath; Sunajadevi, Kalathiparambil Rajendra Pai
Description
Balancing catalytic activity and durability remains a major challenge for nickel-based oxygen evolution reaction (OER) electrodes, especially when supported on earth-abundant metals. Here, we demonstrate how the electrodeposition environment governs the structural and electrochemical evolution of nickel coatings on copper foil toward hydrous NiOOH active layers. Nickel was electrodeposited from sulfate baths at pH 3 and 4 to yield compact (Ni-Cuf-3) and hierarchically nodular (Ni-Cuf-4) films, respectively. Structural and electrochemical analyses reveal that deposition pH dictates the oxidemetal coupling and, consequently, the OER performance. Ni-Cuf-4 exhibited a lower overpotential (434 mV at 50 mA cm?2) and approximately tenfold higher Cdl (2.68 mF cm?2vs. 0.221 mF cm?2), corresponding to a larger density of electrochemically accessible sites. In contrast, Ni-Cuf-3 delivered a higher turnover frequency (TOF ?1 O2 s?1 per Ni site) and superior durability (?60 h at 800 mA cm?2). Impedance spectroscopy highlights distinct interfacial charge transfer characteristics arising from the different film morphology. Importantly, both electrodes achieve reduced nickel loading while suppressing copper dissolution, offering a sustainable pathway to durable, cost-effective OER catalysts. This journal is The Royal Society of Chemistry, 2026
Source
Catalysis Science and Technology;Volume;16;Issue;6;pp.2205-2216
Date
01-01-2026
Publisher
Royal Society of Chemistry
Coverage
Shetty A., Centre for Research in Functional Materials (CRFM), JAIN (Deemed-to-be University), Jain Global Campus, Karnataka, Bengaluru, 562112, India; Mukherjee P., Graduate School of Advanced Science and Technology, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Ishikawa, Nomi, 923-1292, Japan; Higashimine K., Center for Nano Materials and Technology, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Ishikawa, Nomi, 923-1292, Japan; Taniike T., Graduate School of Advanced Science and Technology, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Ishikawa, Nomi, 923-1292, Japan; R. S. V., Centre for Research in Functional Materials (CRFM), JAIN (Deemed-to-be University), Jain Global Campus, Karnataka, Bengaluru, 562112, India; Sunajadevi K.R.P., Department of Chemistry, Christ University, Karnataka, Bengaluru, 560029, India
Rights
Restricted Access; Hardcopy may be available in the library
Relation
ISSN: 20444753; CODEN: CSTAG
Format
online
Language
English
Type
Article

Citation

Shetty, Ankith; Mukherjee, Poulami; Higashimine, Koichi; Taniike, Toshiaki; R. S., Vishwanath; Sunajadevi, Kalathiparambil Rajendra Pai, “Hydrous nickel oxyhydroxide thin films on copper foil as robust electrocatalysts for alkaline oxygen evolution,” CHRIST (Deemed To Be University) Institutional Repository, accessed June 17, 2026, https://archives.christuniversity.in/items/show/22554.

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