Harassment refers to harassment derives from the English verb harass plus the suffixment. The verb harass, in turn, is a loan word from the French, which was already attested in meaning torment, annoyance, bother, trouble.1 It refers to when an individual continually performs undesirable behaviour against a victim. This may include offensive language, rude and cruel remarks, but it must continue over time in order then it is considered as harassment. Harassment has many types like sexual harassment, mental harassment; workplace harassment, domestic harassment and many more it cover wide range of offence Harassment. Harassment against men is a serious issue that needs to be addressed in India, just as harassment against women does. It is important to approach this issue through the lens of gender equality, as both men and women should have the right to live free from harassment and violence. To start with, it is important to acknowledge that men can be victims of harassment and violence, and that this issue is not limited to women alone.
India is one of the largest and fastest-growing markets for Artificial Intelligence technology, with a significant number of startups and established companies developing AI-driven solutions across various industries. However, the legal framework for AI in India is still evolving, and there is currently no specific law or regulation governing the development and use of AI. This lack of regulation creates significant challenges for businesses and policymakers, as it leaves many critical legal and ethical questions unanswered. Artificial Intelligence is rapidly transforming various industries, including healthcare, by providing tools that can help in the analysis and interpretation of medical data. However, the use of AI in the healthcare industry has raised concerns about the privacy and security of personal health information. This research provides a critical analysis of AI and the Indian legal system with special reference to health data protection.
Patent Number: 202241015394, Applicant: Geetha V.
Water pollution has become one of the most serious threats in recent years, as drinking water has become contaminated and polluted. Polluted water can cause a variety of diseases in humans and animals, affecting the ecosystem's life cycle. If water pollution is detected early on, appropriate measures can be implemented, and critical situations can be avoided. To ensure a steady supply of pure water, the water's quality should be monitored in real time. With advancements in sensors, communication, and Internet of Things (IoT) technology, smart solutions for monitoring water pollution are becoming increasingly important.
Patent Number: 202241004856, Applicant: Manabhanjan Sahu.
Human resource aiding system by handling numerous data Abstract: Numerous businesses have implemented human resource information systems over the last decade due to their ability to reduce costs, accelerate the flow of information, and assist human resource managers in making sound decisions. Human resource information systems can assist employees in improving their performance at work. In recent years, human resource information systems have developed into a highly effective tool.
Patent Number: 202241004856, Applicant: Manabhanjan Sahu.
Human resource aiding system by handling numerous data Abstract: Numerous businesses have implemented human resource information systems over the last decade due to their ability to reduce costs, accelerate the flow of information, and assist human resource managers in making sound decisions. Human resource information systems can assist employees in improving their performance at work. In recent years, human resource information systems have developed into a highly effective tool.
Patent Number: 202241011004, Applicant: S. Gowtham Sanjay.
Plasma sprayed 8% yttria stabilized zirconia, i.e. 8Y203-Zr02(8YSZ) coatings with nano grained microstructure are expected to possess superior thermal barrier properties when compared with the coating of same composition but with large micron sized grains in its microstructure. 8YSZ nano powders were spray dried to be converted into easily flowing micron sized (>20 and <100u) plasma sprayable powders. The powders were plasma spray coated on stainless steel (SSL 304) and Aluminium-silicon (Al-Si) alloy substrates.
Patent Number: 202241011004, Applicant: S. Gowtham Sanjay.
Plasma sprayed 8% yttria stabilized zirconia, i.e. 8Y203-Zr02(8YSZ) coatings with nano grained microstructure are expected to possess superior thermal barrier properties when compared with the coating of same composition but with large micron sized grains in its microstructure. 8YSZ nano powders were spray dried to be converted into easily flowing micron sized (>20 and <100u) plasma sprayable powders. The powders were plasma spray coated on stainless steel (SSL 304) and Aluminium-silicon (Al-Si) alloy substrates.
Patent Number: 202241019881, Applicant: Kevin Benny.
Attendance is the fact of being present or absent at a place or an event. One of the most basic things to understand and analyse the response of an event is by recording the attendance of the event. By tracking the sessions attended by the attendees and how long the attendees stay in the event, it is possible to derive a clear picture of how engaged the event was. Attendance monitoring is very important for examining the success or failure of an event. Tracking session attendance is an easy and accurate way to gather attendee feedback and translate this information into useful data.
Patent Number: 202241019881, Applicant: Kevin Benny.
Attendance is the fact of being present or absent at a place or an event. One of the most basic things to understand and analyse the response of an event is by recording the attendance of the event. By tracking the sessions attended by the attendees and how long the attendees stay in the event, it is possible to derive a clear picture of how engaged the event was. Attendance monitoring is very important for examining the success or failure of an event. Tracking session attendance is an easy and accurate way to gather attendee feedback and translate this information into useful data.
Patent Number: 202241019881, Applicant: Kevin Benny.
Attendance is the fact of being present or absent at a place or an event. One of the most basic things to understand and analyse the response of an event is by recording the attendance of the event. By tracking the sessions attended by the attendees and how long the attendees stay in the event, it is possible to derive a clear picture of how engaged the event was. Attendance monitoring is very important for examining the success or failure of an event. Tracking session attendance is an easy and accurate way to gather attendee feedback and translate this information into useful data.
