Formulation of Nickel OxideGraphene Composite Ink and the Fabrication of Thin-Film Electrodes Using Direct Ink Writing
- Title
- Formulation of Nickel OxideGraphene Composite Ink and the Fabrication of Thin-Film Electrodes Using Direct Ink Writing
- Creator
- Thakur N.; Thomas N.; Koshy A.M.; Swaminathan P.; Murthy H.
- Description
- Nickel oxide (NiO) is a p-type material with a wide bandgap of 3.6 to 4eV, and graphene is a zero-bandgap material. When the two materials are combined to form a composite, their structural, optical, and electrical properties are enhanced. This work presents the formulation of nickel oxide (NiO)graphene composite ink (with ethylene glycol as a solvent) for the fabrication of thin-film electrodes using a direct ink writing technique. NiO is used in nanopowder form, which is prepared via a wet-chemical approach. NiO ink is prepared in three different concentrations of 40mg/ml (N1), 60mg/ml (N2), and 70mg/ml (N3). Graphene ink (G) is also prepared in concentrations of 0.5mg/ml (G1), 1mg/ml (G2), and 2mg/ml (G3). Among the pure NiO inks, it was observed that low resistance and uniform printing were obtained for N2. Therefore, N2 is mixed with different concentrations of graphene to form the composite ink, which is further printed on the substrates. The rheological properties of all the formulated inks are measured. An extrusion-based direct-write system is employed for printing the inks on a glass substrate. The printed samples are characterized before and after annealing at 250C for 2h. The resistance of the composite ink (N2G1) is decreased by 53% in comparison with the pure NiO ink (N2). As the conductivity of the composite ink thin film is in the range of M?, they could find application in the field of gas sensing and thermistors. The Minerals, Metals & Materials Society 2024.
- Source
- Journal of Electronic Materials, Vol-53, No. 5, pp. 2573-2582.
- Date
- 2024-01-01
- Publisher
- Springer
- Subject
- composite ink; direct ink writing; nanoparticle synthesis; Nickel oxide ink; nickel oxidegraphene ink
- Coverage
- Thakur N., Department of Electronics and Communication, CHRIST (Deemed to be University), Karnataka, Bengaluru, 560074, India; Thomas N., Electronic Materials and Thin Films Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Madras, Chennai, 600036, India; Koshy A.M., Electronic Materials and Thin Films Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Madras, Chennai, 600036, India; Swaminathan P., Electronic Materials and Thin Films Lab, Department of Metallurgical and Materials Engineering, Indian Institute of Technology Madras, Chennai, 600036, India; Murthy H., Department of Electronics and Communication, CHRIST (Deemed to be University), Karnataka, Bengaluru, 560074, India
- Rights
- All Open Access; Hybrid Gold Open Access
- Relation
- ISSN: 3615235; CODEN: JECMA
- Format
- Online
- Language
- English
- Type
- Article
Collection
Citation
Thakur N.; Thomas N.; Koshy A.M.; Swaminathan P.; Murthy H., “Formulation of Nickel OxideGraphene Composite Ink and the Fabrication of Thin-Film Electrodes Using Direct Ink Writing,” CHRIST (Deemed To Be University) Institutional Repository, accessed February 23, 2025, https://archives.christuniversity.in/items/show/13166.