Glancing angle sputter deposited tungsten trioxide (WO3) thin films for electrochromic applications
- Title
- Glancing angle sputter deposited tungsten trioxide (WO3) thin films for electrochromic applications
- Creator
- Naveen Kumar K.; Shaik H.; Madhavi V.; Imran Jafri R.; Gupta J.; Nithya G.; Sattar S.A.; Ashok Reddy G.V.
- Description
- The columnar growth angle-dependent tungsten oxide (WO3) thin films were grown by using the Glancing angle sputter deposition (GLAD) technique with varying different substrate angles (00, 700, 750, and 800) on Fluorine-doped tin oxide (FTO) and Corning glass (CG) corning glass substrates at room temperature. The surface morphology, crystallographic structure, optical, and electrochemical properties were determined using X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM), UltravioletVisible(UVVis) spectrometer, and electrochemical analyzer, respectively. The structural properties reveal that the films are amorphous in nature. FE-SEM studies observed the columnar growth of the nano-rods and surface porosity. The optical transmittance of the deposited films was decreased from 83 to 78%, and the optical bandgap decreased from 3.08 to 2.88eV with increasing GLAD angle. The electrochemical studies reveal that the GLAD angle influenced the coloration efficiency (CE). The highest CE of 32cm2/C at 600nm and highest Diffusion coefficient (DC) of 6.529 109 cm2s?1 of the films was observed for the films deposited at an angle of 750. 2022, The Author(s), under exclusive licence to Springer-Verlag GmbH, DE part of Springer Nature.
- Source
- Applied Physics A: Materials Science and Processing, Vol-128, No. 11
- Date
- 2022-01-01
- Publisher
- Springer Science and Business Media Deutschland GmbH
- Subject
- Coloration efficiency; Diffusion coefficient; Electrochromism; Glancing angle deposition; Transmittance; Tungsten oxide films
- Coverage
- Naveen Kumar K., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India; Shaik H., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India; Madhavi V., Interdisciplinary Centre for Energy Research, Indian Institute of Science, Bangalore, 560012, India; Imran Jafri R., Department of Physics and Electronics, Christ University, Hosur Road, Bangalore, 560029, India; Gupta J., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India, Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India; Nithya G., Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India, Department of ECE, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India; Sattar S.A., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India; Ashok Reddy G.V., Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India, Department of Physics, SJB Institute of Technology, Kengeri, Karnataka, Bangalore, 560060, India
- Rights
- Restricted Access
- Relation
- ISSN: 9478396; CODEN: APAMF
- Format
- Online
- Language
- English
- Type
- Article
Collection
Citation
Naveen Kumar K.; Shaik H.; Madhavi V.; Imran Jafri R.; Gupta J.; Nithya G.; Sattar S.A.; Ashok Reddy G.V., “Glancing angle sputter deposited tungsten trioxide (WO3) thin films for electrochromic applications,” CHRIST (Deemed To Be University) Institutional Repository, accessed February 24, 2025, https://archives.christuniversity.in/items/show/14844.